Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
Type:
Journal
Info:
Applied Physics Letters 120, 232901 (2022)
Date:
2022-05-22
Author Information
| Name | Institution |
|---|---|
| Alexis Payne | U.S. Army Research Laboratory |
| H. Alex Hsain | North Carolina State University |
| Younghwan Lee | North Carolina State University |
| Nicholas A. Strnad | U.S. Army Research Laboratory |
| Jacob L. Jones | North Carolina State University |
| Brendan Hanrahan | U.S. Army Research Laboratory |
Films
Plasma TiN
Thermal HfAlOx
Thermal HfAlOx
Film/Plasma Properties
Characteristic: Polarization
Analysis: P-V, Polarization-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Loss Tangent
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| SiO2 |
| Pt |
Notes
| 1739 |