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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Jacob L. Jones Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jacob L. Jones returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
2TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
3Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
4The effects of layering in ferroelectric Si-doped HfO2 thin films
5Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
6Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films