Name

Institution

Patrick D. Lomenzo

University of Florida

Peng Zhao

University of Florida

Qanit Takmeel

University of Florida

Saeed Moghaddam

University of Florida

Toshikazu Nishida

University of Florida

Matthew Nelson

North Carolina State University

Chris M. Fancher

North Carolina State University

Everett D. Grimley

North Carolina State University

Xiahan Sang

North Carolina State University

James M. LeBeau

North Carolina State University

Jacob L. Jones

North Carolina State University

Plasma HfSiO_x using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature = 200C

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

3DMASi, (Me₂N)₃SiH, [(CH₃)₂N]₃SiH, Tris(DiMethylAmido) Silane

15112-89-7

Where to buy precursor

O₂, Oxygen

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent 4294A

Hysteresis

Sawyer-Tower circuit

Custom

Leakage Current

I-V, Current-Voltage Measurements

Keithley 4200-SCS

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

JEOL 2010F

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Rigaku

Si(100)

FRAM, Ferroelectric Random Access Memory

677