Toshikazu Nishida Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Toshikazu Nishida returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Annealing behavior of ferroelectric Si-doped HfO2 thin films
2Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
3Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
4TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
5The effects of layering in ferroelectric Si-doped HfO2 thin films