Toshikazu Nishida Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Toshikazu Nishida returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Annealing behavior of ferroelectric Si-doped HfO2 thin films
2Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
3Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
4TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
5The effects of layering in ferroelectric Si-doped HfO2 thin films