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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Chris M. Fancher Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chris M. Fancher returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
2Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
3The effects of layering in ferroelectric Si-doped HfO2 thin films