The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 45, No. 6, pp. 1639-1643
Date:
2004-08-03
Author Information
| Name | Institution |
|---|---|
| Ju Youn Kim | Hanyang University |
| Do Youl Kim | Hanyang University |
| Hee Ok Park | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Substrates
| SiO2 |
Notes
| 1241 |