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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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Do Youl Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Do Youl Kim returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
2Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
3Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma