Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing

Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(1), Jan/Feb 2014, 01A123
Date:
2013-11-30

Author Information

Name Institution
Shaoren DengGhent University
Sammy W. VerbruggenUniversity of Antwerp
Silvia LenaertsUniversity of Antwerp
Johan A. MartensKU Leuven
Sven Van den BergheSCK-CEN
Kilian Devloo-CasierGhent University
Wouter DevulderGhent University
Jolien DendoovenGhent University
Davy DeduytscheGhent University
Christophe DetavernierGhent University

Films

Thermal TiO2



Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: UV-Vis Transmission
Analysis: Custom

Characteristic: Band Gap
Analysis: Tauc Plotting

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Photocatalytic Activity
Analysis: -

Substrates

Si(100)
Quartz

Keywords

Photocatalyst
Doping
PEALD Film Development

Notes

Anneals
7