Custom Remote Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote hardware returned 15 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
2Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
3Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
4Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
5Characteristics of HfO2 thin films grown by plasma atomic layer deposition
6Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
7Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
8Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
9Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
10Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
11Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
12HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
13Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
14The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
15The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process