Custom Remote Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote hardware returned 10 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
2Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
3Characteristics of HfO2 thin films grown by plasma atomic layer deposition
4Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
5Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
6Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
7Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
8Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
9HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
10Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4


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