Publication Information

Title: HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method

Type: Conference Proceedings

Info: ECS Transactions, 3 (15) 89-98 (2007)

Date: 2007-07-01

DOI: http://dx.doi.org/10.1149/1.2721477

Author Information

Name

Institution

Hanyang University

Hanyang University

Films

Plasma HfO2 using Custom Remote

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Interlayer

TEM, Transmission Electron Microscope

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

MEIS, Medium Energy Ion Scattering

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Substrates

SiO2

SiOxNy

Keywords

Notes

1173



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