Title: Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
Type: Journal
Info: Journal of The Electrochemical Society, 154 3 H177-H181 2007
Date: 2007-01-11
DOI: http://dx.doi.org/10.1149/1.2429035
Name
Institution
Hanyang University
Hanyang University
Hanyang University
Hanyang University
Hanyang University
Characteristic
Analysis
Diagnostic
Chemical Composition, Impurities
AES, Auger Electron Spectroscopy
-
Compositional Depth Profiling
AES, Auger Electron Spectroscopy
-
Thickness
TEM, Transmission Electron Microscope
-
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
TEM, Transmission Electron Microscope
-
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
-
Si(100)
Cobalt
Metallic Thin Films
Atomic Layer Deposition
Impurities
Reaction Kinetics
Plasma Deposition
RTA for silicidation
Substrates pirahna + HF dip
34
© 2014-2019 plasma-ald.com