Publication Information

Title:
Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
Type:
Journal
Info:
Journal of The Electrochemical Society, 154 3 H177-H181 2007
Date:
2007-01-11

Author Information

Name Institution
Keunjun KimHanyang University
Keunwoo LeeHanyang University
Sejin HanHanyang University
Wooho JeongHanyang University
Hyeongtag JeonHanyang University

Films

Plasma Co


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Si(100)

Keywords

Cobalt
Metallic Thin Films
Atomic Layer Deposition
Impurities
Reaction Kinetics
Plasma Deposition

Notes

RTA for silicidation
Substrates pirahna + HF dip
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