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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
Type:
Journal
Info:
Journal of The Electrochemical Society, 154 3 H177-H181 2007
Date:
2007-01-11
Author Information
| Name | Institution |
|---|---|
| Keunjun Kim | Hanyang University |
| Keunwoo Lee | Hanyang University |
| Sejin Han | Hanyang University |
| Wooho Jeong | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Plasma Co
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Si(100) |
Keywords
| Cobalt |
| Metallic Thin Films |
| Atomic Layer Deposition |
| Impurities |
| Reaction Kinetics |
| Plasma Deposition |
Notes
| RTA for silicidation |
| Substrates pirahna + HF dip |
| 34 |