Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources

Type:
Journal
Info:
Plasma Science and Technology, Vol.20, No.6, apr
Date:
2018-01-30

Author Information

Name Institution
Haiying WeiBeijing Institute of Graphic Communication
Hongge GuoQi Lu University of Technology
Lijun SangBeijing Institute of Graphic Communication
Xingcun LiBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication

Films

Plasma Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

Silicon

Keywords

Notes

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