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Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
Type:
Journal
Info:
Plasma Science and Technology, Vol.20, No.6, apr
Date:
2018-01-30
Author Information
| Name | Institution |
|---|---|
| Haiying Wei | Beijing Institute of Graphic Communication |
| Hongge Guo | Qi Lu University of Technology |
| Lijun Sang | Beijing Institute of Graphic Communication |
| Xingcun Li | Beijing Institute of Graphic Communication |
| Qiang Chen | Beijing Institute of Graphic Communication |
Films
Plasma Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| Silicon |
Notes
| 1623 |