Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 8 (3) G82-G84 (2005)
Date:
2004-11-04
Author Information
| Name | Institution |
|---|---|
| Ju Youn Kim | Hanyang University |
| Seokhoon Kim | Hanyang University |
| Hyungtak Seo | North Carolina State University |
| Jung-Hyung Kim | Korea Research Institute of Standards and Science (KRISS) |
| Hyeongtag Jeon | Hanyang University |
Films
Plasma ZrO2
Film/Plasma Properties
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Electron Density, ne
Analysis: Cut-off Method
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
| Si(100) |
Notes
| 1245 |