Publication Information

Title:
Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 8 (3) G82-G84 (2005)
Date:
2004-11-04

Author Information

Name Institution
Ju Youn KimHanyang University
Seokhoon KimHanyang University
Hyungtak SeoNorth Carolina State University
Jung-Hyung KimKorea Research Institute of Standards and Science (KRISS)
Hyeongtag JeonHanyang University

Films


Film/Plasma Properties

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Electron Density, ne
Analysis: Cut-off Method

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Si(100)

Keywords

Notes

1245