Publication Information

Title: Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD

Type: Journal

Info: Electrochemical and Solid-State Letters, 8 (3) G82-G84 (2005)

Date: 2004-11-04

DOI: http://dx.doi.org/10.1149/1.1854773

Author Information

Name

Institution

Hanyang University

Hanyang University

North Carolina State University

Korea Research Institute of Standards and Science (KRISS)

Hanyang University

Films

Plasma ZrO2 using Custom Remote

Deposition Temperature = 250C

13801-49-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Electron Density, ne

Cut-off Method

Custom

Plasma Species

OES, Optical Emission Spectroscopy

Unknown

Substrates

Si(100)

Keywords

Notes

1245



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