|2||Strem Chemicals, Inc.||Tetrakis(diethylamino)zirconium, 99%|
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Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor|
|2||Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting|
|3||Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method|
|4||Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD|
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