Publication Information

Title:
The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
Type:
Journal
Info:
Applied Physics Letters 93, 124104 (2008)
Date:
2008-09-09

Author Information

Name Institution
Hyeongtag JeonHanyang University
Youngdo WonHanyang University

Films


Film/Plasma Properties

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: Custom

Substrates

Keywords

Modeling
Density Functional Theory (DFT)

Notes

1349