Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TDEAHf, (Et2N)4Hf, [(C2H5)2N]4Hf, Tetrakis(DiEthylAmido) Hafnium, Hafnium Diethylamide CAS# 19824-55-6

TDEAHf, (Et2N)4Hf, [(C2H5)2N]4Hf, Tetrakis(DiEthylAmido) Hafnium, Hafnium Diethylamide CAS# 19824-55-6 is available from the following source(s):

NumberVendorRegionLink
1Alfa Aesar🇺🇸Tetrakis(diethylamino)hafnium(IV), 99%
2Strem Chemicals, Inc.🇺🇸Tetrakis(diethylamino)hafnium, 99% (99.99+%-Hf, <0.2% Zr) PURATREM
3Pegasus Chemicals🇬🇧Tetrakis(diethylamido)hafnium(IV)
4Apollo Scientific🇬🇧Tetrakis(diethylamino)hafnium 99.999%
5Santa Cruz Biotechnology🇺🇸Tetrakis(diethylamino)hafnium
6American Elements🇺🇸Tetrakis(diethylamido)hafnium(IV)
7Sigma-Aldrich, Co. LLC🇺🇸Tetrakis(diethylamido)hafnium(IV) 99.99%
8Ereztech🇺🇸Tetrakis(diethylamino) hafnium
9Gelest🇺🇸Hafnium Diethylamide

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.