Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 021506 (2017)
Date:
2016-12-22
Author Information
Name | Institution |
---|---|
Rafaiel A. Ovanesyan | Colorado School of Mines |
Dennis M. Hausmann | Lam Research Corporation |
Sumit Agarwal | Colorado School of Mines |
Films
Plasma SiNx
Other SiNx
Plasma SiO2
Plasma SiO2
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: ATR-FTIR
Substrates
Si3N4 |
Silicon |
SiOxNy |
Keywords
Notes
848 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |