Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

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4EpiValenceπŸ‡¬πŸ‡§Hexachloro disilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
2Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
3Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
4Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
5Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
6Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen