Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

Where to buy

NumberVendorRegionLink
1EntegrisπŸ‡ΊπŸ‡ΈHCDS-HP
2EpiValenceπŸ‡¬πŸ‡§Hexachloro disilane
3GelestπŸ‡ΊπŸ‡ΈHexachlorodisilane
4EreztechπŸ‡ΊπŸ‡ΈHexachlorodisilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
2Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
3Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
4Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
5Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
6Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics