Hexachlorodisilane, Si2Cl6, CAS# 13465-77-5

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈHexachlorodisilane
2EreztechπŸ‡ΊπŸ‡ΈHexachlorodisilane
3EntegrisπŸ‡ΊπŸ‡ΈHCDS-HP
4EpiValenceπŸ‡¬πŸ‡§Hexachloro disilane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
2Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
3Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
4Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
5Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
6Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma