Publication Information

Title:
Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
Type:
Journal
Info:
RSC Adv., 2016, 6, 68515-68524
Date:
2016-07-04

Author Information

Name Institution
Luchana L. YusupSejong University
Jae-Min ParkSejong University
Yong-Ho NohSejong University
Sun-Jae KimSejong University
Won-Jun LeeSejong University
Sora ParkKyung Hee University
Young-Kyun KwonKyung Hee University

Films

Thermal SiNx

Hardware used: Custom


CAS#: 7664-41-7

Other SiNx

Hardware used: Custom


CAS#: 7664-41-7

CAS#: 7727-37-9

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Substrates

Silicon

Keywords

Modeling
Compare experiment with modelling

Notes

963