Title: Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
Type: Journal
Info: RSC Adv., 2016, 6, 68515-68524
Date: 2016-07-04
DOI: http://dx.doi.org/10.1039/C6RA10909H
Name
Institution
Sejong University
Sejong University
Sejong University
Sejong University
Sejong University
Kyung Hee University
Kyung Hee University
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
Ellipso Technology Elli-SE
Refractive Index
Ellipsometry
Ellipso Technology Elli-SE
Silicon
Modeling
Compare experiment with modelling
963
© 2014-2019 plasma-ald.com