Search 1536 plasma ALD publications by:
Search 1536 plasma ALD publications by:
Publication Information
Title:
Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
Type:
Journal
Info:
RSC Adv., 2016, 6, 68515-68524
Date:
2016-07-04
Author Information
Name | Institution |
---|---|
Luchana L. Yusup | Sejong University |
Jae-Min Park | Sejong University |
Yong-Ho Noh | Sejong University |
Sun-Jae Kim | Sejong University |
Won-Jun Lee | Sejong University |
Sora Park | Kyung Hee University |
Young-Kyun Kwon | Kyung Hee University |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
Silicon |
Keywords
Modeling |
Compare experiment with modelling |
Notes
963 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |