Publication Information

Title: Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2015, 7 (20), pp 10806-10813

Date: 2015-04-30

DOI: http://dx.doi.org/10.1021/acsami.5b01531

Author Information

Name

Institution

Colorado School of Mines

Lam Research Corporation

Colorado School of Mines

Films

Plasma SiNx using Custom

Deposition Temperature Range = 350-450C

13465-77-5

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Bonding States

ATR-FTIR

Nicolet 6700

Images

SEM, Scanning Electron Microscopy

JEOL 2010F

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

HFS, Hydrogen Forward Scattering

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Substrates

SiO2

Keywords

Notes

355



Shortcuts



© 2014-2018 plasma-ald.com