Publication Information

Title:
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
Type:
Journal
Info:
Chem. Vap. Deposition 2013, 19, 125--133
Date:
2013-05-16

Author Information

Name Institution
Stephen E. PottsEindhoven University of Technology
H. B. ProfijtEindhoven University of Technology
Robin RoelofsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma SiO2


Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si with native oxide

Keywords

Low-Temperature

Notes

577