Publication Information

Title: Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Type: Journal

Info: Chem. Vap. Deposition 2013, 19, 125--133

Date: 2013-05-16

DOI: http://dx.doi.org/10.1002/cvde.201207033

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature = 25C

75-24-1

7782-44-7

Deposition Temperature = 25C

27804-64-4

7782-44-7

Deposition Temperature = 25C

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Substrates

Si with native oxide

Keywords

Low-Temperature

Notes

577



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