
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
Type:
Journal
Info:
Chem. Vap. Deposition 2013, 19, 125--133
Date:
2013-05-16
Author Information
Name | Institution |
---|---|
Stephen E. Potts | Eindhoven University of Technology |
H. B. Profijt | Eindhoven University of Technology |
Robin Roelofs | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Al2O3
Plasma SiO2
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Si with native oxide |
Notes
577 |