Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions

Type:
Journal
Info:
J. Vac. Sci. Technol. B 33(6), Nov/Dec 2015
Date:
2015-09-28
DOI:
http://dx.doi.org/10.1116/1.4932671

Author Information

Name Institution
Peter G. ShanklesOak Ridge National Laboratory
Andrea C. TimmOak Ridge National Laboratory
Mitchel J. DoktyczOak Ridge National Laboratory
Scott T. RettererOak Ridge National Laboratory

Films

Plasma SiO2

Hardware used: Oxford Instruments FlexAL
BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2
CAS#: 27804-64-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Substrates

Silicon

Notes

1389