Publication Information

Title:
Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
Type:
Journal
Info:
Japanese Journal of Applied Physics 57, 06JB03 (2018)
Date:
2018-03-15

Author Information

Name Institution
Yumiko MiyanoToshiba Memory Corporation
Ryota NarasakiToshiba Memory Corporation
Takashi IchikawaToshiba Memory Corporation
Atsushi FukumotoToshiba Memory Corporation
Fumiki AisoToshiba Memory Corporation
Naoki TamaokiToshiba Memory Corporation

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Substrates

Silicon

Keywords

Modeling
High Aspect Ratio

Notes

1431