Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-01

Author Information

Name Institution
Haiwon KimSungkyunkwan University

Films

Plasma SiO2


Film/Plasma Properties

Substrates

Keywords

Notes

230