
Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-12-01
Author Information
Name | Institution |
---|---|
Haiwon Kim | Sungkyunkwan University |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
Notes
230 |