Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Eugene Technology Cardinal Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Eugene Technology Cardinal hardware returned 1 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle