Publication Information

Title:
Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
Type:
Journal
Info:
J. Phys. Chem. C, 2019, 123 (44), pp 27030-27035
Date:
2019-10-15

Author Information

Name Institution
Karsten ArtsEindhoven University of Technology
Mikko UtriainenVTT Technical Research Centre
Riikka L. PuurunenAalto University
Erwin (W.M.M.) KesselsEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology

Films

Plasma SiO2



Plasma Al2O3



Film/Plasma Properties

Characteristic: Conformality, Step Coverage
Analysis: Custom

Substrates

Micropillar Arrays

Keywords

High Aspect Ratio

Notes

1483