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Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
Mikko Utriainen Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for plasma enhanced atomic layer deposition publications authored by Mikko Utriainen returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |