Publication Information

Title:
Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
Type:
Journal
Info:
IEEE ELECTRON DEVICE LETTERS, VOL. 36, NO. 5, PP. 496-498, 2015
Date:
2015-03-16

Author Information

Name Institution
Dustin Zachary AustinOregon State University
Derryl AllmanOregon State University
David PriceOregon State University
Sallie HoseOregon State University
John F. Conley, Jr.Oregon State University

Films

Plasma Al2O3


Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

TaN
Al2O3

Keywords

Capacitors

Notes

514