Publication Information

Title: Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition

Type: Journal

Info: Chem. Mater. 2016, 28, 1247-1255

Date: 2016-02-16

DOI: http://dx.doi.org/10.1021/acs.chemmater.5b04422

Author Information

Name

Institution

Wenzhou University

Wenzhou University

Nanjing University

Nanjing University

Films

Plasma SiO2 using Unknown

Deposition Temperature Range N/A

27804-64-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

DFT, Density Functional Theory

-

Substrates

Keywords

Modeling

Notes

PEALD discussion limited to recap of reference 22 which is here.

768



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