
Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
Type:
Journal
Info:
Chem. Mater. 2016, 28, 1247-1255
Date:
2016-02-16
Author Information
Name | Institution |
---|---|
Guo-Yong Fang | Wenzhou University |
Lina Xu | Wenzhou University |
Jing Ma | Nanjing University |
Aidong Li | Nanjing University |
Films
Film/Plasma Properties
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: DFT, Density Functional Theory
Substrates
Keywords
Modeling |
Notes
PEALD discussion limited to recap of reference 22 which is here. |
768 |