Publication Information

Title:
Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
Type:
Journal
Info:
Chem. Mater. 2016, 28, 1247-1255
Date:
2016-02-16

Author Information

Name Institution
Guo-Yong FangWenzhou University
Lina XuWenzhou University
Jing MaNanjing University
Aidong LiNanjing University

Films

Plasma SiO2


Film/Plasma Properties

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: DFT, Density Functional Theory

Substrates

Keywords

Modeling

Notes

PEALD discussion limited to recap of reference 22 which is here.
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