Publication Information

Title:
'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 143, 2015, Pages 450 - 456
Date:
2015-07-27

Author Information

Name Institution
B. W. H. van de LooEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Gijs DingemansASM Microchemistry Oy
G.J.M. JanssenECN Solar Energy
M.W.P.E. LamersECN Solar Energy
I.G. RomijnECN Solar Energy
A.W. WeeberECN Solar Energy
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma SiO2


Plasma Al2O3


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

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