'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 143, 2015, Pages 450 - 456
Date:
2015-07-27
Author Information
| Name | Institution |
|---|---|
| B. W. H. van de Loo | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Gijs Dingemans | ASM Microchemistry Oy |
| G.J.M. Janssen | ECN Solar Energy |
| M.W.P.E. Lamers | ECN Solar Energy |
| I.G. Romijn | ECN Solar Energy |
| A.W. Weeber | ECN Solar Energy |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma SiO2
Plasma Al2O3
Film/Plasma Properties
Substrates
| Silicon |
Notes
| 555 |