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ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
Type:
Journal
Info:
ECS Journal of Solid State Science and Technology, 3 (3) N39-N45 (2014)
Date:
2014-01-06
Author Information
| Name | Institution |
|---|---|
| A. Salaün | CEA - LETI MINATEC |
| M. Veillerot | CEA - LETI MINATEC |
| F. Pierre | CEA - LETI MINATEC |
| E. Souchier | CEA - LETI MINATEC |
| V. Jousseaume | CEA - LETI MINATEC |
Films
Plasma ZrO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Band Gap
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: nRBS, nonRutherford Back Scattering
Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Substrates
| TiN |
Notes
| PEALD ZrO2 film development with Air Liquid ZyALD precursor. |
| 237 |