ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Type:
Journal
Info:
ECS Journal of Solid State Science and Technology, 3 (3) N39-N45 (2014)
Date:
2014-01-06

Author Information

Name Institution
A. Sala√ľnCEA - LETI MINATEC
M. VeillerotCEA - LETI MINATEC
F. PierreCEA - LETI MINATEC
E. SouchierCEA - LETI MINATEC
V. JousseaumeCEA - LETI MINATEC

Films

Plasma ZrO2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Band Gap
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: nRBS, nonRutherford Back Scattering

Characteristic: Chemical Composition, Impurities
Analysis: NRA, Nuclear Reaction Analysis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Substrates

TiN

Keywords

High-k Dielectric Thin Films
PEALD Film Development

Notes

PEALD ZrO2 film development with Air Liquid ZyALD precursor.
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