PEALD ZrO2 Films Deposition on TiN and Si Substrates
Type:
Conference Proceedings
Info:
ECS Transactions, 25 (8) 235-241 (2009)
Date:
2009-10-05
Author Information
Name | Institution |
---|---|
D. Monnier | STMicroelectronics |
Mickaël Gros-Jean | STMicroelectronics |
Emilie Deloffre | STMicroelectronics |
Béatrice Doisneau | Grenoble-CNRS-Université Joseph Fourier |
Stéphane Coindeau | Grenoble-CNRS-Université Joseph Fourier |
Alexandre Crisci | Grenoble-CNRS-Université Joseph Fourier |
Jérôme Roy | European Synchrotron Radiation Facility (ESRF) |
Yanyu Mi | European Synchrotron Radiation Facility (ESRF) |
Blanka Detlefs | European Synchrotron Radiation Facility (ESRF) |
Jorg Zegenhagen | European Synchrotron Radiation Facility (ESRF) |
Christophe Wyon | Consortium des Moyens Technologiques Communs (CMTC) |
Christine Martinet | Université Lyon |
Fabien Volpi | Grenoble-CNRS-Université Joseph Fourier |
Elisabeth Blanquet | Grenoble-CNRS-Université Joseph Fourier |
Films
Plasma ZrO2
Film/Plasma Properties
Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
TiN |
Si(100) |
Notes
727 |