Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Mickaël Gros-Jean Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Mickaël Gros-Jean returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
2Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
3PEALD ZrO2 Films Deposition on TiN and Si Substrates
4Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
5Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications