
Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
Type:
Journal
Info:
Microelectronic Engineering 87 (2010) 301 - 305
Date:
2009-06-22
Author Information
| Name | Institution |
|---|---|
| T. Bertaud | Université de Savoie |
| C. Bermond | Université de Savoie |
| T. Lacrevaz | Université de Savoie |
| Christophe Vallée | French National Centre for Scientific Research (CNRS) |
| Y. Morand | STMicroelectronics |
| B. Fléchet | Université de Savoie |
| A. Farcy | STMicroelectronics |
| Mickaël Gros-Jean | STMicroelectronics |
| S. Blonkowski | STMicroelectronics |
Films
Film/Plasma Properties
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| TiN |
| SiO2 |
Notes
| Paper lists TEMAZr as the precursor but calls it "TriEthyl MethAcrylate de Zirconium". |
| 735 |
