Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
Type:
Journal
Info:
Microelectronic Engineering 87 (2010) 301 - 305
Date:
2009-06-22
Author Information
Name | Institution |
---|---|
T. Bertaud | Université de Savoie |
C. Bermond | Université de Savoie |
T. Lacrevaz | Université de Savoie |
Christophe Vallée | French National Centre for Scientific Research (CNRS) |
Y. Morand | STMicroelectronics |
B. Fléchet | Université de Savoie |
A. Farcy | STMicroelectronics |
Mickaël Gros-Jean | STMicroelectronics |
S. Blonkowski | STMicroelectronics |
Films
Film/Plasma Properties
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conductance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
TiN |
SiO2 |
Notes
Paper lists TEMAZr as the precursor but calls it "TriEthyl MethAcrylate de Zirconium". |
735 |