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Publication Information

Title: Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors

Type: Journal

Info: Microelectronic Engineering 87 (2010) 301 - 305

Date: 2009-06-22

DOI: http://dx.doi.org/10.1016/j.mee.2009.06.016

Author Information

Name

Institution

Université de Savoie

Université de Savoie

Université de Savoie

French National Centre for Scientific Research (CNRS)

STMicroelectronics

Université de Savoie

STMicroelectronics

STMicroelectronics

STMicroelectronics

Films

Plasma ZrO2 using Unknown

Deposition Temperature = 250C

175923-04-3

7782-44-7

Plasma HfO2 using Unknown

Deposition Temperature = 250C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Breakdown Voltage

I-V, Current-Voltage Measurements

HP 4155A Semiconductor Parameter Analyzer

Capacitance

C-V, Capacitance-Voltage Measurements

Novocontrol Dielectric Spectrometer

Conductance

C-V, Capacitance-Voltage Measurements

Novocontrol Dielectric Spectrometer

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Novocontrol Dielectric Spectrometer

Capacitance

C-V, Capacitance-Voltage Measurements

Agilent 4294A

Conductance

C-V, Capacitance-Voltage Measurements

Agilent 4294A

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Agilent 4294A

Capacitance

C-V, Capacitance-Voltage Measurements

Anritsu 37387C Vector Network Analyzer

Conductance

C-V, Capacitance-Voltage Measurements

Anritsu 37387C Vector Network Analyzer

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

Anritsu 37387C Vector Network Analyzer

Substrates

TiN

SiO2

Keywords

Notes

Paper lists TEMAZr as the precursor but calls it "TriEthyl MethAcrylate de Zirconium".

735

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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