Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Tris(DiMethylAmido)Antimony, Sb[(CH3)2N]3, TDMASb, CAS# 7289-92-1

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Tris(dimethylamido)antimony
2Pegasus Chemicals🇬🇧Tris(dimethylamino)antimony
3Strem Chemicals, Inc.🇺🇸Tris(dimethylamino)antimony (99.99%-Sb) PURATREM
4Gelest🇺🇸Tris(Dimethylamino)Antimony
5Ereztech🇺🇸Tris(dimethylamido) antimony(III)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1GeSbTe deposition for the PRAM application
2GeSbTe deposition for the PRAM application
3Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
4Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
5Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon