Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Di(Tert-Butyl)Telluride, But2Te, CAS# 83817-35-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
2Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon