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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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Markus Bosund Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Markus Bosund returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties of AlN grown by plasma enhanced atomic layer deposition
2High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
3Tribological properties of thin films made by atomic layer deposition sliding against silicon
4Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
5GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
6Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
7Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
8Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces