Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Applied Physics 111, 063511 (2012)
Date:
2012-02-14
Author Information
| Name | Institution |
|---|---|
| Päivi Mattila | Aalto University |
| Markus Bosund | Aalto University |
| Teppo Huhtio | Aalto University |
| Harri Lipsanen | Aalto University |
| M. Sopanen | Aalto University |
Films
Film/Plasma Properties
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Characteristic: Lifetime
Analysis: TRPL, Time Resolved PhotoLuminescence
Substrates
| InGaAs |
Notes
| 636 |