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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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A. Varpula Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by A. Varpula returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
2High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
3Properties of AlN grown by plasma enhanced atomic layer deposition
4Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
5Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
6Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas