Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Lauri Kilpi Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Lauri Kilpi returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tribological properties of thin films made by atomic layer deposition sliding against silicon
2Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors