
Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B128 (2017)
Date:
2016-12-05
Author Information
Name | Institution |
---|---|
Sydney C. Buttera | Carleton University |
David J. Mandia | Carleton University |
Sean T. Barry | Carleton University |
Films
Thermal Al2O3
Plasma AlN
Film/Plasma Properties
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Si(100) |
Notes
Lots of O in the AlN. |
914 |