3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III), CAS# 32093-39-3

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Hexakis(dimethylamino)dialuminum 98% (99.9%-Al) TDMAA
2Sigma-Aldrich, Co. LLC🇺🇸Tris(dimethylamido)aluminum(III)
3Alfa Aesar🇺🇸Tris(dimethylamino)aluminum dimer
4Santa Cruz Biotechnology🇺🇸Aluminum dimethylamide
5Ereztech🇺🇸Tris(dimethylamino)aluminum

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4Experimental and theoretical determination of the role of ions in atomic layer annealing