3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III), CAS# 32093-39-3

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NumberVendorLink
1EreztechTris(dimethylamino)aluminum

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
3Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor