3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III), CAS# 32093-39-3

Where to buy

NumberVendorRegionLink
1Sigma-Aldrich, Co. LLC🇺🇸Tris(dimethylamido)aluminum(III)
2Santa Cruz Biotechnology🇺🇸Aluminum dimethylamide
3Ereztech🇺🇸Tris(dimethylamino)aluminum
4Strem Chemicals, Inc.🇺🇸Hexakis(dimethylamino)dialuminum 98% (99.9%-Al) TDMAA
5Alfa Aesar🇺🇸Tris(dimethylamino)aluminum dimer

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
2Experimental and theoretical determination of the role of ions in atomic layer annealing
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor