Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy 3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III) CAS# 32093-39-3

3DMAAl, (Me2N)3Al, (Me2N)6Al2, Tris (DiMethylAmido) Aluminum(III) CAS# 32093-39-3 is available from the following source(s):

NumberVendorRegionLink
1Santa Cruz Biotechnology🇺🇸Aluminum dimethylamide
2Sigma-Aldrich, Co. LLC🇺🇸Tris(dimethylamido)aluminum(III)
3Strem Chemicals, Inc.🇺🇸Hexakis(dimethylamino)dialuminum 98% (99.9%-Al) TDMAA
4Alfa Aesar🇺🇸Tris(dimethylamino)aluminum dimer
5Ereztech🇺🇸Tris(dimethylamino)aluminum

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