Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

Type:
Journal
Info:
Nanomaterials 2021, 11, 907
Date:
2021-03-31

Author Information

Name Institution
Yury KoshtyalPeter the Great St.Petersburg Polytechnic University
Ilya MitrofanovPeter the Great St.Petersburg Polytechnic University
Denis V. NazarovPeter the Great St.Petersburg Polytechnic University
Oleg MedvedevPeter the Great St.Petersburg Polytechnic University
Artem KimPeter the Great St.Petersburg Polytechnic University
Ilya EzhovPeter the Great St.Petersburg Polytechnic University
Aleksandr M. RumyantsevPeter the Great St.Petersburg Polytechnic University
Anatoly A. PopovichPeter the Great St.Petersburg Polytechnic University
Maxim Yu MaximovPeter the Great St.Petersburg Polytechnic University

Films


Plasma NiOx


Plasma CoOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry

Substrates

Si(100)
Stainless Steel 316L

Keywords

Notes

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