Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
Type:
Journal
Info:
Nanomaterials 2021, 11, 907
Date:
2021-03-31
Author Information
Name | Institution |
---|---|
Yury Koshtyal | Peter the Great St.Petersburg Polytechnic University |
Ilya Mitrofanov | Peter the Great St.Petersburg Polytechnic University |
Denis V. Nazarov | Peter the Great St.Petersburg Polytechnic University |
Oleg Medvedev | Peter the Great St.Petersburg Polytechnic University |
Artem Kim | Peter the Great St.Petersburg Polytechnic University |
Ilya Ezhov | Peter the Great St.Petersburg Polytechnic University |
Aleksandr M. Rumyantsev | Peter the Great St.Petersburg Polytechnic University |
Anatoly A. Popovich | Peter the Great St.Petersburg Polytechnic University |
Maxim Yu Maximov | Peter the Great St.Petersburg Polytechnic University |
Films
Plasma NiCoO
Plasma NiOx
Plasma CoOx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Substrates
Si(100) |
Stainless Steel 316L |
Notes
1602 |