Bis(cyclopentadienyl)nickel, Nickelocene, Cp2Ni, CAS# 1271-28-9

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Bis(cyclopentadienyl) nickel
2Strem Chemicals, Inc.🇺🇸Bis(cyclopentadienyl)nickel, 99% (Nickelocene)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
2Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
3Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
4Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
5Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
6Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
7Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
8Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
9Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
10Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
11Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
12Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
13Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
14Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
15Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier