Publication Information

Title:
Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 5 (6) C64-C66 (2002)
Date:
2002-02-22

Author Information

Name Institution
Junghun ChaeKorea Advanced Institute of Science and Technology
Hyoung-Sang ParkGenitech Co., Ltd.
Sang-Won KangKorea Advanced Institute of Science and Technology

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Adhesion
Analysis: Tape Test

Substrates

TiN

Keywords

Notes

Direct NiCp2 + H2 plasma resulted in non-metallic powder
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