Publication Information

Title:
Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
Type:
Journal
Info:
Mater. Res. Express 7 (apr) 046401
Date:
2020-03-24

Author Information

Name Institution
Lin-Yan XieFudan University
Dong-Qi XiaoFudan University
Jun-Xiang PeiFudan University
Jingyong HuoFudan University
Xiaohan WuFudan University
Wen-Jun LiuFudan University
Shi-Jin DingFudan University

Films

Plasma NiOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Conductivity Type
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Substrates

Silicon
Quartz
TaN

Keywords

Notes

1476