2022 Year in Review

April 2023 Stats


The publication database currently has 1686 entries.
208 Films
282 Precursors
78 Dep Hardware Sets
254 Characteristics
93 Theses
5172 Authors

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2021 Year in Review
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Recent Database Additions
Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis Experimental and theoretical determination of the role of ions in atomic layer annealing Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature

Shi-Jin Ding Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Shi-Jin Ding returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
2Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
3Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
4Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
5Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
6Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
7Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
8Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
9Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
10Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment

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