Publication Information

Title: Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors

Type: Journal

Info: J. Mater. Chem. C, 2016, 4, 11059-11066

Date: 2016-10-30

DOI: http://dx.doi.org/10.1039/C6TC03606F

Author Information

Name

Institution

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Fudan University

Films

Plasma Ni using Unknown

Deposition Temperature Range = 160-280C

1271-28-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Work Function

UPS, Ultraviolet Photoemission Spectroscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

-

Resistivity, Sheet Resistance

Four-point Probe

-

Substrates

Keywords

Notes

957



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