David Wei Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by David Wei Zhang returned 12 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
2Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition
3Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
4Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
5Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
6Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
7Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
8Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
9Optical properties and bandgap evolution of ALD HfSiOx films
10Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
11Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
12Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors