December 2022 Stats


The publication database currently has 1657 entries.
204 Films
274 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5093 Authors

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Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy Innovative remote plasma source for atomic layer deposition for GaN devices Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

David Wei Zhang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by David Wei Zhang returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
3Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
4Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
5Optical properties and bandgap evolution of ALD HfSiOx films
6Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
7Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
8Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
9Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
10Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
11Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing

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